MSE Seminar Series: Joshua Schumacher
Friday, April 4, 2014
1:00 p.m.-2:00 p.m.
Room 2110 Chemical and Nuclear Engineering Building
For More Information:
301 405 5240
Advanced Applications for Focused Ion Beam (FIB)/Dual Beam Microscopy at the Center for Nanoscale Science and Technology at NIST
NanoFab Operations Group
Ion milling has a long history in materials processing, and direct write focused ion beam (FIB) milling instruments have recently emerged as essential tools for nanoscale fabrication and characterization. A state of the art FIB is extremely powerful and yet easy to use in applications such as materials analysis, circuit modification, and reliability assays. When combined with a scanning electron microscope (SEM), the analytical capabilities of a dual-beam instrument are greatly enhanced and three-dimensional inspection and manipulation is greatly simplified.
This talk will provide some background about FIB technology, discuss tool capabilities, and illustrate some of the many applications and projects that have been completed at the Center for Nanoscale Science and Technology (CNST), NIST’s nanotechnology user facility in Gaithersburg Maryland.
About the Speaker
Joshua Schumacher is a Process Engineer in the NanoFab Operations Group. He received a B.S. and a Ph.D. in Electrical Engineering from the University of South Florida (USF), where he also received a certificate in Materials Science. Dr. Schumacher has over 10 years of experience using focused ion beam systems, scanning electron microscopy, and transmission electron microscopy for materials characterization. In the Center for Nanoscale Science and Technology at NIST, he is responsible for operating two FEI Helios 650 dual beam/FIB systems and training NanoFab users on the instruments. Dr. Schumacher holds a patent for a carbon nanotube-based technique to improve the detection and analysis of peptides at very low concentrations, developed in collaboration with the Moffitt Cancer Center (Tampa, Florida).